Selected Publications

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J. K. Shurtleff, D. D. Allred, R. T. Perkins, and J. M. Thorne
Thin film deposition techniques currently being used to produce multilayer x-ray optics (MXOs) have difficulty producing smooth, uniform multilayers with d-spacings less than about twelve angstroms. We are investigating atomic layer epitaxy (ALE) as an alternative to these techniques. ALE is a chemical vapor deposition technique which deposits an atomic layer of material during each cycle of the deposition process. The thickness of a film deposited by ALE depends only on the number of cycles. Multilayers deposited by ALE should be smooth and uniform with precise d-spacings which makes ALE an excellent technique for producing multilayer x-ray optics. We have designed and built an ALE system and we have used this system to deposit ZnSe using diethyl zinc and hydrogen selenide.
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D. D. Allred (et al.)
The main lines in the photoluminescence spectra of Zn1Cd1−xTe single crystals grown by a modified Bridgman method in the compositional range of 0 ≤ X ≤ 0.25 have been identified. All crystals show only near-band-edge emission. To assist in the identification, various samples with different compositions were annealed under a Cd atmosphere. In the pure crystals, the prominent (A°,X) bound exciton line, as well as the doublet at longer wavelengths, disappear after the annealing. In contrast, the treatments do not change significantly the PL spectra of the mixed crystals.
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David D. Allred and Qi Wang (et al.)
Laser Raman spectroscopy has been found to be useful for characterizing amorphous semiconductor multilayers, especially the interfaces of multilayers. Recently, we have extended this technique to the characterization of magnetron sputtered multilayers commonly used as reflectors in soft x-ray optics. Unlike the multilayers previously studied which contained only semiconductors and dielectrics, these are generally semiconductor/metal multilayers. We report here on the Raman characterization of the most common class of multilayers used in soft x-ray optics, those that contain a high density metal like tungsten interspersed with layers of carbon. In all of the metal/carbon multilayers the dominate feature in the Raman spectra is due to a-C. The a-C spectra consists of a broad peak at about 1560 cm-1 (G-peak) and a shoulder at about 1400 cm-1 (D-peak). This can be deconvoluted with Gaussian line shapes to yield two peaks (one at about 1560 to 1570 cm-1 and the other at about 1380 to 1420 cm-1). Among the W/C multilayer samples peak positions and relative magnitudes changed little with carbon thickness over the range of 1 to 12 nm. Significant differences are, however, seen as the identity of the metal component is altered or, especially, as the preparations are varied. For example, the intensity ratio of the D-peak to G-peak was much larger for multilayer samples prepared under conditions of good plasma confinement.
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Raymond T. Perkins, David D. Allred, Larry V. Knight, and James M. Thorne
Methods of designing strong, high transmission soft x-ray windows are discussed. A material which contains several elements, most notably 0, N, and C, produce the most spectrally neutral window. It is noted that a predominantly single element material such as diamond is in reality an edge filter. A structure to support very thin films and to provide exceptional mechanical strength is discussed. Pressure cycling data for such a supported window are presented.
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Qi Wang, David D. Allred, and L. V. Knight (et al.)
Laser Raman spectroscopy has been found to he useful for characterizing amorphous semi-conductor niultilayers especially the interfaces of multilayers. We have extended this technique to the characterization of W/C niultilayers used in soft x-ray optics and ultrathin sputtered carbon films. Unlike the multilayers previously studied which contained only semiconductors and di-electrics, these are semiconductor/metal multilayers. The dominate Raman feature is due to a-C and consists of a broad peak at about 1580 cm-1 (G-peak) and a shoulder at about 1400 cm -1 (D-peak). This was deconvoluted with Gaussians to yield two peaks (one at 1570 cm' and the other at 1420 cim 1). Among the multilayer samples peak positions and relative magnitudes changed little. The intensity ratio of the D-peak to G-peak was much larger for multilayer sample, however , than for the single layer pair samples. This may due to different. forms (amorphous or crystalline) of tungsten layer in the samples and indicate the differences in the structure of carbon layers and tor bonding structure at interfaces.
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J. K .Shurtleff, D. D. Allred, R. T. Perkins, and J. M. Thorne
Thin film deposition techniques currently being used to produce multilayer x-ray optics (MXOs) have difficulty producing smooth, uniform multilayers with d-spacings less than about twelve angstroms. We are investigating atomic layer epitaxy (ALE) as an alternative to these techniques. ALE is a relatively new thin film deposition technique which we believe can produce MXOs with very small d-spacings. ALE accomplishes this by depositing a single layer of atoms during each cycle of the deposition process. Multilayers deposited by ALE should have sharp interfaces and smooth, uniform layers with precise d-spacings.