Selected Publications
We measured the transmittance and reflectance of two reactively sputtered diodes prepared with approximately 20 nm of UOx in the extreme ultraviolet (XUV) at the Advanced Light Source at Lawrence Berkeley National Laboratory. Fitting the reflectance data to the Parratt model yielded the thickness of the UOx film. This thickness combined with a simple analysis of the transmission measurements provides estimates for the imaginary part of the index of refraction for UOx at approximately every tenth of a nanometer from about 3 nm to 30 nm with emphasis in the 12- to 13-nm range. The analysis discussed in this paper yields only the imaginary part of the complex index but will lead to a more robust analysis to find both the real and imaginary parts of the index of refraction. These values provide researchers with information for modeling, design, and fabrication of optical systems in the extreme ultraviolet.