Hierarchically Structured Materials

Abstract: X-ray phase diffraction gratings can be designed to behave in a fashion similar to blazed gratings, directing the majority of the energy into certain desired orders. They should be easy to fabricate using conventional semiconductor production technology, and offer advantages in design flexibility and efficiency over conventional amplitude grating or blazed grating structures. As a multilayered structure, a phase grating has structure in depth as well as across the surface. Most theoretical analyses in the literature treat the embedded structure through simplifying approximations or assumptions. We will discuss a model which treats the embedded structure explicitly using the Fresnel-Kirchhoff integral in the Fraunhofer diffraction limit. This approach produces a set of equations which are identical to the result for an amplitude diffraction grating except for an additional factor which depends on the phase relationships of the various surfaces in the multilayer stack.

Abstract: We have produced arrays of 10,000 sharp p-type silicon points using an etch plus oxidation method. These points were used as electron emitters. No high vacuum caseation or high temperature cleaning was needed to observe the electron emission. These are seen to be photosensitive sources of electrons at 200 K and 300 K. They were also used to produce AlK(alpha ) x rays. This constitutes the first use of etched, point arrays for generating electrons for x-ray sources.

Abstract: Tungsten/carbon (W/C) multilayer thin films were prepared by dc magnetron sputtering. All samples consisted of 30 layer pairs with a nominal d spacing varying from 2.5 to 14 nm, the W layer thickness was kept at 2 nm in all samples. The W/C multilayers were subjected to isochronal anneals in a quartz tube furnace at the temperature range from 500 to 950 °C under a flow of high purity Ar gas. X‐ray diffraction, Raman scattering, and Auger depth profile were used to characterize the structure of the as‐prepared and annealedmultilayerfilms. Both the W and C layers appear to be amorphous as‐prepared. An overcoat of 30 nm of plasma enhanced chemical vapor deposited silicon nitride was found to inhibit oxidation during annealing. For those multilayers containing thinner carbon layers (<1 nm), the formation of crystalline W2C occurs at annealing temperature as low as 500 °C and a very small expansion (<2%) in the layer d spacing is observed. On the other hand, for all multilayers with carbon layer thickness equal or greater than 2 nm, crystallization occurs at much higher annealing temperatures and the crystalline phases observed were alpha‐W and WC. It is also observed that in the latter group the period increases monotonically with increasing annealing temperature, the total expansion is about 10% and affects both W and C layers approximately equally. The expansion stops at the crystallization temperature which occurs at 900 °C or higher. The expansion is under investigation but may be interpreted as due to the structural ordering processes in the amorphous W and C layers.

Abstract: Soft x-ray filter designs for the Brigham Young University `Goldhelox Project' are discussed. Three polymers intended for use as a supportive substrate for a soft x-ray solar filter having a passband centered at 171 angstroms are examined. The use of polymer substrates is examined because of vibrational and mechanical stresses associated with the shuttle launch, preventing the use of a free standing filter, and because of Goldhelox's special need to locate the filter near the imaging plane. The uniform consistency of a polymer support prevents any imaging of the filter support structure, as would occur if a traditional mesh support were used. The polymer substrates investigated are: AP-1, Formvar, and polypropylene. Their transmissive characteristics of the polymers are examined along with the feasibility of their use. Transmission as a function of energy for each polymer is given over an energy range of 10 to 180 eV.

Abstract: Infrared optically black baffle surfaces are an essential component of many advanced optical systems. All internal surfaces in advanced infrared optical sensors that require stray light management to achieve resolution are of primary concern in baffle design. Current industrial materials need improvements to meet advanced optical sensor systems requirements for optical, survivability, and endurability. Baffles are required to survive and operate in potentially severe environments. Robust diffuse-absorptive black surfaces, which are (1) thermally and mechanically stable to threats of X-ray, launch, and in-flight maneuver conditions, with specific densities to allow an acceptable weight load, (2) handleable during assembly, (3) cleanable, and (4) adaptive to affordable manufacturing, are required as optical baffle materials. An overview of recently developed advanced infrared optical baffle materials, requirements, manufacturing strategies, and the Optics MODIL (Manufacturing Operations Development and Integration Laboratory) Advanced Baffle Program is discussed.