Thin-Film Metrology

Layer stacks used to measure ultrathin iron catalyst films by ellipsometry

Image from Metrology of ultrathin iron catalyst films by spectroscopic ellipsometry, J. Vac. Sci. Technol. A 44, 043406 (2026).

Faculty: David Allred, Robert Davis, Richard Vanfleet

Every project here depends on knowing exactly what we have made. We use spectroscopic ellipsometry to measure film thickness and optical constants, from nanometer-thin iron catalyst layers for nanotube growth to far-ultraviolet mirror coatings. We also use quantitative scanning transmission electron microscopy and mechanical mapping of thin films.

Selected Publications

Complete publication and student thesis lists for each professor are on the People and Publications page.